Hi, i am a student in republic of korea.
My model is to observe how E-field enhancement is made by constructing nano gold patterns on a slica galss, applying incident laser from z-axis. However, I have a question which is that why the results are different between applying a big base silica galss and a small one during my modeling. I think if I do same pattern models, base size is unrelated to the result. but in my model, e-field enhancement to which a big slica glass is applied is bigger than e-field enhancement to which a small one is done.
so, my question is
" why are they different? "
" If they are naturally different, what is the reason? "
" or my modeling is wrong, how can i modify? "
thanks.
p.s. two model images is added ,
My model is to observe how E-field enhancement is made by constructing nano gold patterns on a slica galss, applying incident laser from z-axis. However, I have a question which is that why the results are different between applying a big base silica galss and a small one during my modeling. I think if I do same pattern models, base size is unrelated to the result. but in my model, e-field enhancement to which a big slica glass is applied is bigger than e-field enhancement to which a small one is done.
so, my question is
" why are they different? "
" If they are naturally different, what is the reason? "
" or my modeling is wrong, how can i modify? "
thanks.
p.s. two model images is added ,